Please use this identifier to cite or link to this item: http://localhost/handle/Hannan/177648
Title: Fabrication of Arbitrarily Narrow Vertical Dielectric Slots in Silicon Waveguides
Authors: Kapil Debnath;Ali Z. Khokhar;Graham T. Reed;Shinichi Saito
Year: 2017
Publisher: IEEE
Abstract: Slot waveguides are used for many photonic applications. However, existing fabrication techniques impose restrictions on the width of the slot region. Here, we propose and experimentally demonstrate a fabrication process to realize an arbitrarily narrow vertical dielectric slot in a silicon waveguide. Using this fabrication method, we have realized silicon slot waveguides with a 10-nm oxide slot region. The propagation loss of the fabricated slot waveguide was 1.36 &x00B1; 0.3 dB/mm.
URI: http://localhost/handle/Hannan/177648
volume: 29
issue: 15
More Information: 1269,
1272
Appears in Collections:2017

Files in This Item:
File SizeFormat 
7964692.pdf783.89 kBAdobe PDF
Title: Fabrication of Arbitrarily Narrow Vertical Dielectric Slots in Silicon Waveguides
Authors: Kapil Debnath;Ali Z. Khokhar;Graham T. Reed;Shinichi Saito
Year: 2017
Publisher: IEEE
Abstract: Slot waveguides are used for many photonic applications. However, existing fabrication techniques impose restrictions on the width of the slot region. Here, we propose and experimentally demonstrate a fabrication process to realize an arbitrarily narrow vertical dielectric slot in a silicon waveguide. Using this fabrication method, we have realized silicon slot waveguides with a 10-nm oxide slot region. The propagation loss of the fabricated slot waveguide was 1.36 &x00B1; 0.3 dB/mm.
URI: http://localhost/handle/Hannan/177648
volume: 29
issue: 15
More Information: 1269,
1272
Appears in Collections:2017

Files in This Item:
File SizeFormat 
7964692.pdf783.89 kBAdobe PDF
Title: Fabrication of Arbitrarily Narrow Vertical Dielectric Slots in Silicon Waveguides
Authors: Kapil Debnath;Ali Z. Khokhar;Graham T. Reed;Shinichi Saito
Year: 2017
Publisher: IEEE
Abstract: Slot waveguides are used for many photonic applications. However, existing fabrication techniques impose restrictions on the width of the slot region. Here, we propose and experimentally demonstrate a fabrication process to realize an arbitrarily narrow vertical dielectric slot in a silicon waveguide. Using this fabrication method, we have realized silicon slot waveguides with a 10-nm oxide slot region. The propagation loss of the fabricated slot waveguide was 1.36 &x00B1; 0.3 dB/mm.
URI: http://localhost/handle/Hannan/177648
volume: 29
issue: 15
More Information: 1269,
1272
Appears in Collections:2017

Files in This Item:
File SizeFormat 
7964692.pdf783.89 kBAdobe PDF